发明名称 SUPERCRITICAL FLUID PROCESSING DEVICE AND ITS PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a supercritical fluid processing device capable of preventing a damage of a filter and having a high cleaning performance and further a few energy consumption in cleaning or drying an object to be processed dipped or wet in a rinse agent comprising the supercritical fluid, and to provide its processing method. SOLUTION: The supercritical fluid processing device in which the dipped and wetted object to be processed is placed in a high pressure vessel in the rinse agent, and the fluid, solvent, which is in a gas state at room temperature and normal pressure, and in a liquid state under high pressures is introduced to the high pressure vessel to clean or dry the object to be processed. The supercritical fluid processing device has a supercritical state storing means capable of storing the solvent supplied from a supplying source of the solvent, and a filtering means for filtering a solid material in the solvent in the supercritical state from the supercritical state storing means. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005116757(A) 申请公布日期 2005.04.28
申请号 JP20030348639 申请日期 2003.10.07
申请人 HITACHI SCI SYST LTD 发明人 TAKABORI SAKAE;MIYAZAWA KOICHI;TAKASU HISAYUKI;IWATANI TORU
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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