| 发明名称 |
FORTIFIED, COMPENSATED AND UNCOMPENSATED PROCESS-SENSITIVE SCATTEROMETRY TARGETS |
| 摘要 |
A scatterometry target is provided in which a plurality of parallel elongated features are placed, each having a length in a lengthwise direction. A plurality of stress-relief features are disposed at a plurality of positions along the length of each elongated feature.
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| 申请公布号 |
US2005089775(A1) |
申请公布日期 |
2005.04.28 |
| 申请号 |
US20030605751 |
申请日期 |
2003.10.23 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ARCHIE CHARLES N.;SENDELBACH MATTHEW J. |
| 分类号 |
G03F7/20;H01L23/544;(IPC1-7):G03C5/00;H01L23/58;H01L29/10;G01B11/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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