| 发明名称 |
Method for operating a semiconductor processing apparatus |
| 摘要 |
A method for operating a semiconductor processing apparatus that plasma-processes a semiconductor wafer mounted on a stage placed in a container using a plasma generated therein. The method includes setting a temperature of the semiconductor wafer, and controlling an operation of the semiconductor processing apparatus based on information about the temperature of the semiconductor wafer which is set.
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| 申请公布号 |
US2005089625(A1) |
申请公布日期 |
2005.04.28 |
| 申请号 |
US20040997888 |
申请日期 |
2004.11.29 |
| 申请人 |
KANNO SEIICHIRO;NISHIO RYOJI;YOSHIOKA KEN;KANAI SABUROU;KIHARA HIDEKI;YAMAMOTO HIDEYUKI |
发明人 |
KANNO SEIICHIRO;NISHIO RYOJI;YOSHIOKA KEN;KANAI SABUROU;KIHARA HIDEKI;YAMAMOTO HIDEYUKI |
| 分类号 |
H01L21/00;(IPC1-7):B05D1/00;H01L21/31;H01L21/469 |
主分类号 |
H01L21/00 |
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