发明名称 |
Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
摘要 |
A method of correcting deflection distortion includes dividing a deflection area to which a charged-particle beam is deflected into equal initial blocks as an initial setting, calculating an initial aberration amount for each of the initial blocks generated when the charged-particle beam is deflected, dividing the deflection area into main blocks in accordance with a change rate of the initial aberration amount; calculating a main aberration amount for each of the main blocks generated when the charged-particle beam is deflected, and calculating a correction value correcting a deflection distortion based on the main aberration amount. |
申请公布号 |
US2005088099(A1) |
申请公布日期 |
2005.04.28 |
申请号 |
US20040948555 |
申请日期 |
2004.09.24 |
申请人 |
OTA TAKUMI;NAKASUGI TETSURO |
发明人 |
OTA TAKUMI;NAKASUGI TETSURO |
分类号 |
G03F1/08;G03F1/68;G03F1/76;G03F1/78;G03F7/20;H01J25/22;H01J37/147;H01J37/153;H01J37/304;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J25/22 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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