发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high sensitivity which suppresses permeation of a high concentration developing solution and shows excellent solubility in a developing solution by exposure, that is, a photosensitive composition having wide development latitude and high sensitivity. <P>SOLUTION: The photosensitive composition contains a novolac resin and an IR ray absorbent, and its solubility in an alkaline aqueous solution is increased by IR laser light. The distribution of weight average molecular weight (Mw) of the novolac resin in terms of polystyrene measured by gel permeation chromatography (GPC) with mono-dispersion polystyrene as the reference shows that the area ratios of GPS patterns in the ranges of 100 to 1,000, 1,000 to 3,000 and 3,000 to 30,000 are 5 to 20%, 50 to 80% and 10 to 35%, respectively, with respect to the whole area. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005114895(A) 申请公布日期 2005.04.28
申请号 JP20030346753 申请日期 2003.10.06
申请人 FUJI PHOTO FILM CO LTD 发明人 HATANAKA YUSUKE;WATANABE KOTARO
分类号 G03F7/023;G03F7/00;G03F7/004 主分类号 G03F7/023
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