发明名称 ECCENTRICITY MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an eccentricity measuring apparatus capable of measuring precisely assembled-up eccentricity of a small-sized optical system having a face with a small apparent curvature radius. SOLUTION: This eccentricity measuring instrument has a light source 1 (or an index lighted by the light source 1); an optical projection system 11 for projecting an image of the light source 1 on a measured face of the measured optical system 8 constituted of four or more of optical faces; a photodetector 13 for detecting a position of a reflected image of the light source 1 reflected on the measured face; an image focusing optical system 12 for image-focusing the reflected image on a photoreception face of the photodetector 13; a means 21 for calculating an eccentric quantity of the measured face, based on a measured result of the image position of the reflected image; and means 22-27 for changing a space between the measured face, and the optical projection system 11 and the image focusing optical system 12, under the condition where optical axes of the light source 1 and the optical projection system 11 get substantially coaxial to an optical axis of the image focusing optical system. A space L between a conjugate position O by the optical projection system 11 of the light source 1 and a conjugate position I by the image focusing optical system 12 of the photoreception face in the photodetector 13 is variable within a range of from≥0 mm to 50 mm. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005114404(A) 申请公布日期 2005.04.28
申请号 JP20030345645 申请日期 2003.10.03
申请人 OLYMPUS CORP 发明人 YASUDA EIJI
分类号 G01B11/00;G01M11/00;(IPC1-7):G01M11/00 主分类号 G01B11/00
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