THINNER COMPOSITION FOR REMOVING PHOTORESIST

摘要

The present invention relates to a thinner composition for removing photoresist, and more particularly, to a thinner composition for removing photoresist comprising (a) 100 weight parts of propylene glycol monoalkyl ether acetate, and (b) 0.001 to 1 weight parts of polyethylene oxide condensate. By applying the thinner composition for removing photoresist according to the present invention on the edges and backsides of glass substrates used in liquid crystal display devices and wafers used in the preparation of semiconductors, it is possible to effectively remove photoresist unnecessarily attached thereto in a short time period. Also, the thinner composition has high safety to the human body and is applicable in various processes by reducing steps at the interface. Further, it can simplify the preparation processes of liquid crystal display devices and semiconductors, thereby economically improving production yields.