| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve a problem in a conventional EEM method wherein dimension shape accuracy, surface roughness, and the like of a polishing tool must be managed severely and the relative position of the polishing tool with respect to a workpiece must be controlled. <P>SOLUTION: This polishing tool comprises a spreading head 19 which has a polish end face 23 facing a projecting optical surface 16 and partitions a buffer chamber 24 surrounded with the polish end face 23, a working liquid introduction passage 25 which is formed in the spreading head 19 and guides working liquid into the buffer chamber 24, a head holder 26 mounted with the spreading head 19, a holder bracket 28 for supporting the head holder 26 via a spherical surface seat 27 abutting on the head holder 26, a permanent magnet 29 for energizing the head holder 26 to the spherical surface seat 27, a head feeing means for moving the holder bracket 28 along the projecting optical surface 16, a head pressing means for energizing the holder bracket 28 to the projecting optical surface 16 side, and a working liquid supply means which is connected with the head holder 26 and supplies the working liquid from the working liquid introduction passage 25 into the buffer chamber 24. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
