| 摘要 |
PROBLEM TO BE SOLVED: To provide a lighting optical system by which high quality exposure is provided by easily adjusting the parallelism of the main light beams of exposure light or a telecentric degree on the exposed side in desired throughput, and to provide an aligner having the illuminating optical system. SOLUTION: The lighting optical system for illuminating a face to be irradiated with light from a light source includes a condensing optical system which leads light from the light source to the surface to be illuminated. The condensing optical system has first and second optical systems. The first and second optical systems constitute a beam expander optical system which changes the diameter of an incident luminous flux. The beam expander optical system is designed so as to be movable as an integral unit along an optical axis. COPYRIGHT: (C)2005,JPO&NCIPI
|
