| 发明名称 |
Apparatus for processing substrate and method of doing the same |
| 摘要 |
The apparatus for processing a substrate includes a substrate carrier for carrying a substrate, a chemical-applying unit for applying chemical to the substrate, and a gas-applying unit for applying gas atmosphere to the substrate.
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| 申请公布号 |
US2005087301(A1) |
申请公布日期 |
2005.04.28 |
| 申请号 |
US20040941881 |
申请日期 |
2004.09.16 |
| 申请人 |
NEC LCD TECHNOLOGIES, LTD |
发明人 |
KIDO SHUSAKU |
| 分类号 |
H01L21/3065;C23F1/00;H01L21/02;H01L21/027;H01L21/304;H01L21/306;H01L21/677;H01L21/68;(IPC1-7):C23F1/00 |
主分类号 |
H01L21/3065 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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