发明名称 VACUUM PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To unite an electrostatic chuck and a heating apparatus, and effectually and uniformly heat an article attracted and held on the electrostatic chuck. SOLUTION: A substrate 22 is coated with a first insulation layer 23, and the top surface of the first insulation layer 23 is provided with dielectrics 24, 25 constituting an electrode of the electrostatic chuck, and the lower surface of the same an integral heater 26 including a heating element 26a which is spirally arranged. Further, a second insulation layer 27 is provided on these surfaces. The thickness H of the substrate 22 is made greater than a radial interval d of the heating element 26a. Accordingly, heat from the heater is transmitted through conduction via the substrate for satisfactory heat transfer efficiency, and the substrate having a predetermined thickness is interposed so that a pattern of the heating element of the heater does not appear on the back of the article to permit the article to be uniformly heated. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005117064(A) 申请公布日期 2005.04.28
申请号 JP20040356456 申请日期 2004.12.09
申请人 TOKYO ELECTRON LTD;SHIN ETSU CHEM CO LTD 发明人 ARAMI JIYUNICHI;ISHIKAWA KENJI;DEGUCHI YOICHI;KAWADA ATSUO;YANAGISAWA ISAO
分类号 H01L21/3065;H01L21/205;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/3065
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