发明名称 ELECTROOPTICAL DEVICE AND ITS MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electrooptical device, such as a liquid crystal device, which can effectively stop picture quality deterioration and its manufacturing method, and a semiconductor device which is suitably made thin and its manufacturing method. SOLUTION: When the electrooptical device having a substrate, a circuit part formed on the substrate while having an inter-layer insulating film as a top layer, and pixel electrodes, formed by pixel parts sectioned on the substrate, further on the circuit parts is manufactured, one surface of the substrate and the other surface are both chemimechanically polished after at least the circuit part is formed on one surface of the substrate. In concrete, both the surfaces of a TFT array substrate of the liquid crystal device are polished in the order of (1) the reverse surface and (2) the circuit surface of the circuit part 100. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005114840(A) 申请公布日期 2005.04.28
申请号 JP20030345926 申请日期 2003.10.03
申请人 SEIKO EPSON CORP 发明人 TAKAHARA KENICHI
分类号 G02F1/1333;G02F1/1368;G09F9/30;(IPC1-7):G09F9/30;G02F1/133;G02F1/136 主分类号 G02F1/1333
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