| 摘要 |
PROBLEM TO BE SOLVED: To stably illuminate a mask by an illumination light in a prescribed polarized state when a rod type integrator is used for an illuminance uniformizing member. SOLUTION: The projection aligner includes an illumination lighting system ILS for illuminating the illumination light from an exposure light source 1 to a reticule R, and a projection light system PL for projecting the image of the pattern of the reticule R onto a wafer W. The illumination lighting system ILS includes the rod integrator 14R of a substantially rectangular solid shape made of cubic system crystals with its lengthwise direction working as (100) direction of the crystal in order to uniformize illumination distribution on the reticule R, the rod integrator 14R in its lengthwise direction is arranged substantially in parallel with the optical axis AX2 of the illumination lighting system ILS, and its illumination light includes a prescribed linearly polarized light as a principal component. COPYRIGHT: (C)2005,JPO&NCIPI
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