CVD SYSTEM AND PROCESS FOR DEPOSITING ORGANIC INSULATING FILM

摘要

PROBLEM TO BE SOLVED: To provide a CVD system and a process for depositing an organic insulating film capable of preventing leakage of material gas to the rear surface of a substrate. SOLUTION: A substrate mounting table 13 comprises a rotating member 15 provided with a rotating means 19 and a cooling means 20, and a fixed member 16 provided around the rotating member 15. A substrate 14 is vacuum sucked to the rotating member 15 by a vacuum suction means employing a vacuum pump 18. An opening 25 is provided between the rotating member 15 and the fixed member 16 and gas introduced from a gas container 23 trough piping 22 to a gas supply section 21 is supplied between the substrate 14 and the substrate mounting table 13 from the opening 25. COPYRIGHT: (C)2005,JPO&NCIPI