Forming control instruction for mask writer for semiconductor manufacturing involves inserting auxiliary surface with second color value into intermediate region before dividing first area so first area is divided into two sub-areas

摘要

The method involves providing a circuit layout (10) containing the pattern to be transferred with a first area (30) associated with a first color value characterizing an exposure, at least one second area (20) enclosing the first in at least one intermediate region (40) and associated with a different color value, dividing the first area into rectangular exposure areas (31), translating and storing the exposure areas into/in the control instruction. An auxiliary surface (50) with the second color value is inserted into the intermediate region before dividing the first area so the first area is divided into two sub-areas, one of which is rectangular so it can be filed with a rectangular exposure area in the division step.