| 发明名称 |
COMPOSITIONS FOR PREPARING LOW DIELECTRIC MATERIALS |
| 摘要 |
Materials with a low dielectric constant and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen. |
| 申请公布号 |
SG110057(A1) |
申请公布日期 |
2005.04.28 |
| 申请号 |
SG20030003511 |
申请日期 |
2003.05.30 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
BRIAN KEITH PETERSON;JOHN FRANCIS KIRNER;SCOTT JEFFREY WEIGEL;JAMES EDWARD MACDOUGALL;THOMAS ALAN DEIS;THOMAS ALBERT BRAYMER;KEITH DOUGLAS CAMPBELL;MARTIN DEVENNEY;C. ERIC RAMBERG;KONSTANTINOS CHONDROUDIS;KEITH CENDAK |
| 分类号 |
B32B27/00;C01B;C01B33/12;C04B35/14;C08K5/09;C08L101/00;C09D1/00;H01B3/12;H01L21/312;H01L21/316 |
主分类号 |
B32B27/00 |
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