| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection exposure apparatus which can form a pattern on an accurate position of a projection-object substrate even when the object substrate is deformed or distorted. SOLUTION: The projection exposure apparatus has a configuration such that the object substrate is moved and the dimension of a projected image is varied to minimize the deviation of a measurement position with respect to an expected layout on the basis of: the expected layout showing expected arrangement of a plurality of reference position marks in the extended direction; and the measured position of a plurality of reference position marks measured by a position measuring means. COPYRIGHT: (C)2005,JPO&NCIPI
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