发明名称 |
METHOD OF PRODUCING SILICON NANO-WIRE |
摘要 |
PROBLEM TO BE SOLVED: To produce a silicon nano-wire having the length of several centimeters or above. SOLUTION: In the manufacturing method, the silicon nano-wire is grown on a substrate arranged at a position where the temperature gradient of 10°C/cm is formed between 1,200-900°C in the downstream side of an inert gas stream by vaporizing a sintered compact of silicon powder in the inert gas stream. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005112701(A) |
申请公布日期 |
2005.04.28 |
申请号 |
JP20030352799 |
申请日期 |
2003.10.10 |
申请人 |
NATIONAL INSTITUTE FOR MATERIALS SCIENCE |
发明人 |
NODA TETSUJI;SUZUKI YUTAKA;ARAKI HIROSHI;YO FUMI;ISHIKAWA NOBUHIRO |
分类号 |
C01B33/02;(IPC1-7):C01B33/02 |
主分类号 |
C01B33/02 |
代理机构 |
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地址 |
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