发明名称 METHOD OF PRODUCING SILICON NANO-WIRE
摘要 PROBLEM TO BE SOLVED: To produce a silicon nano-wire having the length of several centimeters or above. SOLUTION: In the manufacturing method, the silicon nano-wire is grown on a substrate arranged at a position where the temperature gradient of 10°C/cm is formed between 1,200-900°C in the downstream side of an inert gas stream by vaporizing a sintered compact of silicon powder in the inert gas stream. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005112701(A) 申请公布日期 2005.04.28
申请号 JP20030352799 申请日期 2003.10.10
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 NODA TETSUJI;SUZUKI YUTAKA;ARAKI HIROSHI;YO FUMI;ISHIKAWA NOBUHIRO
分类号 C01B33/02;(IPC1-7):C01B33/02 主分类号 C01B33/02
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