发明名称 |
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor |
摘要 |
A semiconductor processing apparatus for processing a semiconductor wafer includes a sensor for monitoring a processing state of the semiconductor processing apparatus, a processing result input unit which inputs measured values for processing results of a semiconductor wafer processed by the semiconductor processing apparatus, and a model equation generation unit relying on sensed data acquired by the sensor and the measured values to generate a model equation for predicting a processing result using the sensed data as an explanatory variable. The apparatus includes a processing result prediction unit which predicts a processing result based on the model equation and the sensed data, and a process recipe control unit which compares the predicted processing result with a previously set value to control a processing condition. The process recipe control unit includes a controller which controls at least one among a plurality of different processing performances for processing of the semiconductor wafer. |
申请公布号 |
US2005087298(A1) |
申请公布日期 |
2005.04.28 |
申请号 |
US20040999006 |
申请日期 |
2004.11.30 |
申请人 |
TANAKA JUNICHI;KITSUNAI HIROYUKI;KAGOSHIMA AKIRA;SHIRAISHI DAISUKE;YAMAMOTO HIDEYUKI;IKUHARA SHOJI;MASUDA TOSHIO |
发明人 |
TANAKA JUNICHI;KITSUNAI HIROYUKI;KAGOSHIMA AKIRA;SHIRAISHI DAISUKE;YAMAMOTO HIDEYUKI;IKUHARA SHOJI;MASUDA TOSHIO |
分类号 |
G05B19/418;H01L21/66;(IPC1-7):C23F1/00 |
主分类号 |
G05B19/418 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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