发明名称 Monolithically integrated circuit comprising a thin film resistor, and fabrication method thereof
摘要 <p>A monolithically integrated circuit comprises a thin film resistor (8) with low resistance and low temperature coefficient; a high frequency lateral power transistor device (9) including gate (17), source (16) and drain (15) regions, and a Faraday shield layer region (22; 22') above the gate region; and at least a first metallization layer (28) there above for electrical connection of the gate (17), source (16) and drain (15) regions through via holes filled with conductive material (29c-d). The thin film resistor (8) and the Faraday shield layer region (22; 22') are made in the same conductive layer, which is arranged below the first metallization layer (28).</p>
申请公布号 EP1526575(A2) 申请公布日期 2005.04.27
申请号 EP20040445089 申请日期 2004.09.07
申请人 INFINEON TECHNOLOGIES AG 发明人 NORSTROEM, HANS;JOHANSSON, TED
分类号 H01L27/04;H01L27/06;H01L21/336;H01L21/822;H01L21/8234;H01L21/8249;H01L29/06;H01L29/40;H01L29/417;H01L29/45;H01L29/49;H01L29/78;(IPC1-7):H01L27/06 主分类号 H01L27/04
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