| 摘要 |
The invention relates to a diaphragm ( 1 ) for an integrator unit of a microlithographic projection exposure system. The diaphragm ( 1 ) includes a diaphragm opening ( 3 ), which is symmetrical with respect to a first axis of symmetry ( 5 ). The widths of the diaphragm aperture ( 3 ) in the direction of the axis of symmetry ( 5 ) are dependent on the distance (y) from the first axis of symmetry ( 5 ). The widths are greater than or equal to the width at y=0. The diaphragm ( 1 ), together with a cylindrical integrator, forms an integrator unit, which is located in an illumination system.
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