| 发明名称 |
Mass production of cross-section TEM samples by focused ion beam deposition and anisotropic etching |
| 摘要 |
A method of preparing a TEM sample. A focused ion beam is used to deposit a mask on the material to be sampled. Reactive ion etching removes material not protected by the mask, leaving a wall thin enough to be imaged by TEM.
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| 申请公布号 |
US6884362(B2) |
申请公布日期 |
2005.04.26 |
| 申请号 |
US20030368321 |
申请日期 |
2003.02.18 |
| 申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
TSUNG LANCY;ANCISO ADOLFO |
| 分类号 |
G01N1/32;(IPC1-7):H01L21/00 |
主分类号 |
G01N1/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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