发明名称 Methods and configuration to simplify connections between polysilicon layer and diffusion area
摘要 An electronic device supported on a semiconductor substrate. The semiconductor device includes a diffusion area in the substrate and a polysilicon layer extending over the substrate and contacting the diffusion area. The electronic device further includes a conductive contact covering and contacting both the polysilicon layer and the diffusion area. Therefore, the semiconductor device disclosed in this invention includes poly-to-diffusion connection for a semiconductor device that has a diffusion are and a polysilicon area. The semiconductor device further includes a contact that covers both the diffusion area and the polysilicon area with a contact filling material forming the connection between these two areas.
申请公布号 US6885079(B2) 申请公布日期 2005.04.26
申请号 US20030685623 申请日期 2003.10.14
申请人 SHAU JENG-JYE 发明人 SHAU JENG-JYE
分类号 H01L21/768;H01L21/8234;(IPC1-7):H01L29/00 主分类号 H01L21/768
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