| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem wherein manufacturing margin becomes small and manufacturing yield is reduced, when a channel is reduced in length in conventional manufacturing methods where manufacturing processes are reduced in number. SOLUTION: A new technology of rationalizing a signal wire forming process and a pixel electrode forming process by introducing a halftone exposure technology; a new technology for rationalizing an electrode terminal protective layer forming process, by introducing a halftone exposure technology into the process of a well-known technology of anodizing a source/drain interconnect line; a scanning line forming process and a semiconductor layer forming process; a scanning line forming process and an etching stop layer forming process; and a four-piece mask process plan, a three-piece mask process of a TN liquid crystal display device by a combination of a technology, and a new technology for rationalizing a scanning line forming process and a contact forming process by introducing a halftone exposure technology are constructed. COPYRIGHT: (C)2005,JPO&NCIPI |
