发明名称 |
METHOD FOR REDUCING LEACHING IN METAL-COATED MEMS |
摘要 |
<p>A method is provided for preventing dopant leaching from a doped structural film during fabrication of a microelectromechanical system. A microstructure that includes the doped structural film, sacrificial material, and metallic material is produced with a combination of deposition, patterning, and etching techniques. The sacrificial material is dissolved with a release solution that has a substance destructive to the sacrificial material. This substance also acts as an electrolyte, forming a galvanic cell with the doped structural film and metallic material acting as electrodes. The effects of the galvanic cell are suppressed by including a nonionic detergent mixed in the release solution.</p> |
申请公布号 |
WO2005035144(A1) |
申请公布日期 |
2005.04.21 |
申请号 |
WO2003US28505 |
申请日期 |
2003.09.09 |
申请人 |
PTS CORPORATION |
发明人 |
STAPLE, BEVAN;MILLER, DAVID;MULLER, LILAC |
分类号 |
B05D5/12;B81C1/00;(IPC1-7):B05D5/12 |
主分类号 |
B05D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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