| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoelectron microscope, having a light source system for reliably performing a high-resolution measurement, such as work function distribution measurement and magnetic domain distribution measurement, and to provide a high-sensitivity measurement method by the photoelectron microscope. SOLUTION: A condensing lens 32 is accommodated in a vacuum chamber 5, by using the vacuum chamber 5 in which a sample 7 is installed and the condensing lens 32 in which irradiation light is condensed on the surface of the sample 7 in the photoelectron microscope, having the light source system for excitation for irradiating the sample with irradiation light from a light source 1. Further, the light source 1 is arranged outside the vacuum chamber 5, a condenser lens 2 for allowing irradiation light from the light source 1 to be nearly parallel light is installed between the light source 1 and the vacuum chamber 5, and a transmission window 6 for transmitting the illumination light while the vacuum chamber 5 is being sealed may be installed between the condenser lens 2 and the condensing lens 32. Further, a diffraction grating for selecting the wavelength of the illumination light or a polarizing filter for selecting the direction of circular polarization in the illumination light is used between the condenser lens 2 and the transmission window 6, thus realizing the high-resolution measurement of a work function distribution and magnetic domain distribution on the surface of the sample. COPYRIGHT: (C)2005,JPO&NCIPI
|
