发明名称 Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
摘要 Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers are disclosed herein. In one embodiment, the system includes a gas phase reaction chamber, a first exhaust line coupled to the reaction chamber, first and second traps each in fluid communication with the first exhaust line, and a vacuum pump coupled to the first exhaust line to remove gases from the reaction chamber. The first and second traps are operable independently to individually and/or jointly collect byproducts from the reaction chamber. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
申请公布号 US2005081786(A1) 申请公布日期 2005.04.21
申请号 US20030687458 申请日期 2003.10.15
申请人 KUBISTA DAVID J.;DOAN TRUNG T.;BREINER LYLE D.;WEIMER RONALD A.;BEAMAN KEVIN L.;PING ER-XUAN;ZHENG LINGYI A.;BASCERI CEM 发明人 KUBISTA DAVID J.;DOAN TRUNG T.;BREINER LYLE D.;WEIMER RONALD A.;BEAMAN KEVIN L.;PING ER-XUAN;ZHENG LINGYI A.;BASCERI CEM
分类号 C23C16/44;C23C16/455;(IPC1-7):C23C16/00 主分类号 C23C16/44
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