摘要 |
<p>[PROBLEMS] Disclosed is a novel beta-diketonato metal complex which can be advantageously used in a method wherein a metal thin film is produced by CVD. [MEANS FOR SOLVING PROBLEMS] Disclosed is a metal complex represented by the following formula: (1) (wherein X represents a silyl ether group having a specific structure; Y represents the above-mentioned silyl ether group or an alkyl group; Z represents a hydrogen atom or an alkyl group; M represents Lu, Ir, Pd, Ni, V, Ti, Zr, Hf, Al, Ga, In, Sn, Pb, Zn, Mn, It, Cr, Mg, Co, Fe or Ag; and n represents the valence of the metal atom M.)</p> |
申请人 |
UBE INDUSTRIES, LTD.;KADOTA, TAKUMI;HASEGAWA, CHIHIRO;WATANUKI, KOUHEI |
发明人 |
KADOTA, TAKUMI;HASEGAWA, CHIHIRO;WATANUKI, KOUHEI |