发明名称 METAL COMPLEX HAVING beta-DIKETONATO LIGAND AND METHOD FOR PRODUCING METAL-CONTAINING THIN FILM
摘要 <p>[PROBLEMS] Disclosed is a novel beta-diketonato metal complex which can be advantageously used in a method wherein a metal thin film is produced by CVD. [MEANS FOR SOLVING PROBLEMS] Disclosed is a metal complex represented by the following formula: (1) (wherein X represents a silyl ether group having a specific structure; Y represents the above-mentioned silyl ether group or an alkyl group; Z represents a hydrogen atom or an alkyl group; M represents Lu, Ir, Pd, Ni, V, Ti, Zr, Hf, Al, Ga, In, Sn, Pb, Zn, Mn, It, Cr, Mg, Co, Fe or Ag; and n represents the valence of the metal atom M.)</p>
申请公布号 WO2005035823(A1) 申请公布日期 2005.04.21
申请号 WO2004JP15083 申请日期 2004.10.13
申请人 UBE INDUSTRIES, LTD.;KADOTA, TAKUMI;HASEGAWA, CHIHIRO;WATANUKI, KOUHEI 发明人 KADOTA, TAKUMI;HASEGAWA, CHIHIRO;WATANUKI, KOUHEI
分类号 C07F7/18;C23C16/18;(IPC1-7):C23C16/18 主分类号 C07F7/18
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