摘要 |
<p>An embossing method and apparatus (20) comprises a rotary embossing device (32) having a radial direction (28) and an outer peripheral surface (34). The embossing device (32) includes at least one embossing-component (48) which extends at least radially outward from the peripheral surface (34), and is configured to provide for a first embossing-pattern (38). The embossing device (32) also includes a rotary shaft member (46). A base embossing-segment (50) is operatively joined to the rotary shaft member (46) and configured to carry a first base-section (40) of the first embossing-component (48). In a particular aspect, a first, supplemental embossing-segment (52) is operatively joined and selectively positionable on the rotary shaft member (46), and is configured to carry a first supplemental-section (42) of the first embossing-component (48). In other aspects, a first spacing mechanism (56) can adjust a radial position of the first, supplemental embossing-segment (52), and a first, supplemental attachment-mechanism (60) can secure the radial position of the second supplemental embossing-segment (52).</p> |
申请人 |
KIMBERLY-CLARK WORLDWIDE, INC.;PASTERSKI, JESSE, JAMES;LAY, WEN, TONG;WEIHER, MARCUS, DAVID;BOTT, MICHAEL, JOHN;LAKE, ANDREW, MICHAEL;RASMUSSEN, SHELLEY, RAE;ABBA, RODNEY, LAWRENCE;CHEN, YUNG-KUN |
发明人 |
PASTERSKI, JESSE, JAMES;LAY, WEN, TONG;WEIHER, MARCUS, DAVID;BOTT, MICHAEL, JOHN;LAKE, ANDREW, MICHAEL;RASMUSSEN, SHELLEY, RAE;ABBA, RODNEY, LAWRENCE;CHEN, YUNG-KUN |