| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner capable of realizing a higher NA while suppressing the upsizing of an apparatus scale by suppressing an increase of the number of optical parts used by deriving the optimum conditions for an incidence angle and reflectance to a reflecting mirror serving to bend an optical path. SOLUTION: The projection aligner comprises a light source for emitting laser light, an optical path bending mirror for bending an optical path on the way, a lighting optical system for irradiating a reticle, and a projection optical system for imaging a pattern on the reticle on a wafer substrate. In the projection aligner, there can be dealt with a high NA aligner having an image space numerical aperture NAw of the projection optical system falls within a range 0.8≤NAw≤1.0 by satisfyingΔR≤3%, when an incidence angleαof a light ray with respect to a normal line of the optical path bending mirror is restricted within an angular range 30°≤α≤60°, and the maximum value of differences of reflectances over the whole range of the incidence angle. COPYRIGHT: (C)2005,JPO&NCIPI
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