发明名称 |
Image processing alignment method and method of manufacturing semiconductor device |
摘要 |
An alignment mark is arranged to be within an image screen and the alignment mark is formed with rectangular patterns having varied dimensions from each other. The signal waveforms from each of the rectangular patterns are measured. The number of the rectangular patterns with normal waveforms is compared to the minimum required number of marks prescribed beforehand. The amount of deviation in alignment is calculated by excluding the abnormal measured result.
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申请公布号 |
US2005082693(A1) |
申请公布日期 |
2005.04.21 |
申请号 |
US20040986661 |
申请日期 |
2004.11.12 |
申请人 |
NEC ELECTRONICS CORPORATION |
发明人 |
FUJIMOTO MASASHI |
分类号 |
H01L21/027;G03F9/00;H01L23/544;(IPC1-7):H01L21/823 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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