| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a radiation sensitive acid-forming agent (for a photoresist) used for a highly sensitive and high resolution radiation sensitive resin composition excellent in preservation stability and pattern forms, an onium salt compound suitable as the radiation sensitive acid-forming agent, and a positive type radiation sensitive resin composition containing the radiation sensitive acid-forming agent. <P>SOLUTION: The radiation sensitive acid-forming agent contains the onium salt the cationic part of which is expressed by formula (1) [wherein, A is I or S; (m) is ≥1 integer; (n) is ≥0 integer; (x) is 1-15 integer; Ar<SP>1</SP>, Ar<SP>2</SP>are each a monovalent (substituted) aromatic hydrocarbon group, or the like; and R is a (substituted) alkyl, a monovalent (substituted) alicyclic hydrocarbon group, or the like]. The onium salt compound consists of a compound the cationic part of which is expressed by formula (1) and R in formula (1) is a (substituted) alicyclic hydrocarbon group. The positive type radiation sensitive resin composition contains (A) the radiation sensitive acid-forming agent and (B) a resin containing a leaving group by an acid. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
