| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a cured product having excellent hardness and heat resistance, and useful in various uses, and to provide a photosensitive resin composition using the same, a photosensitive resin composition for a photolithographic spacer and a method for manufacturing the same. <P>SOLUTION: The resin composition contains a material having an aspect ratio of ≥10 and a thickness of ≤100 nm and a radical-polymerizable monomer and further contains one of the following compounds (1) to (3): (1) binder resin essentially including a monomeric unit formed of a cationic monomer, (2) binder resin essentially including a cationic monomer and a monomeric unit formed of a cationic monomer and/or binder resin not including a monomeric unit formed of a cationic monomer, (3) binder resin essentially including a monomeric unit formed of a cationic monomer and binder resin not including a monomeric unit formed of a cationic monomer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
