发明名称 SURFACE TREATMENT APPARATUS AND METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a surface treatment apparatus which can evenly treat a substrate surface with a rotating body having a plurality of wire materials. <P>SOLUTION: The surface treatment apparatus as a washing device comprises brushes 10A and 10B, a brush drive mechanism 50 that causes the rotating brushes 10A and 10B to approach a substrate 30, and potential measurement devices 41A<SB>1</SB>to 41A<SB>3</SB>that measure the potentials generating at respective conductor patterns 31A<SB>1</SB>to 31A<SB>3</SB>on the substrate 30 by the contact and separation between the front ends of scrub materials of the running brushes 10A and 10B . <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005103450(A) 申请公布日期 2005.04.21
申请号 JP20030340626 申请日期 2003.09.30
申请人 HITACHI LTD;HITACHI DISPLAYS LTD 发明人 TAKAHARA YOICHI;YAMADA MASAHIRO;DAIROKU NORIYUKI;ASAKA SHOJI;TAKAHASHI TOMOAKI;KAWANAKAKO HIROSHI;YAMAMOTO HIDEAKI
分类号 B08B1/04;C03C23/00;C11D11/00;H01L21/304;(IPC1-7):B08B1/04 主分类号 B08B1/04
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