PLASMA TREATMENT METHOD AND APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment method and a plasma treatment apparatus capable of raising the uniformity of treatments beginning with a doping concentration. SOLUTION: In such a state that a mixed gas consisting of a helium gas and a diborane gas is enclosed in a vacuum chamber 900 by stopping air exhaustion inside the vacuum chamber 900 and by stopping a supply of a gas into the vacuum chamber 900, while generating plasma in a vacuum container 1, a plasma treatment is carried out by supplying a high frequency power to a sample electrode 6 and introducing boron near a surface of a substrate 9. COPYRIGHT: (C)2005,JPO&NCIPI