发明名称 Defect inspection method and apparatus therefor
摘要 A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
申请公布号 US2005083519(A1) 申请公布日期 2005.04.21
申请号 US20040971109 申请日期 2004.10.25
申请人 MAEDA SHUNJI;YOSHIDA ATSUSHI;SHIBATA YUKIHIRO;YOSHIDA MINORU;UTO SACHIO;SHISHIDO HIROAKI;NAKATA TOSHIHIKO 发明人 MAEDA SHUNJI;YOSHIDA ATSUSHI;SHIBATA YUKIHIRO;YOSHIDA MINORU;UTO SACHIO;SHISHIDO HIROAKI;NAKATA TOSHIHIKO
分类号 G01B11/30;G01N21/956;G02B21/06;G06T1/00;(IPC1-7):G11B7/00 主分类号 G01B11/30
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