PROCESSING LIQUID, AND SUBSTRATE PROCESSING METHOD AND APPARATUS USING PROCESSING LIQUID

摘要

PROBLEM TO BE SOLVED: To provide a processing liquid and a substrate processing method and apparatus using the processing liquid whereby any water mark can be suppressed from being formed on the surface of a low-permittivity material (low-k material). SOLUTION: The processing liquid is the one for processing the substrate wherein a low-permittivity material is exposed to the external at least in a portion of the surface thereof. The processing liquid has at least a hydrophilic group and a hydrophobic group respectively in its one molecule, and includes an organic substance having volatility at a room temperature. COPYRIGHT: (C)2005,JPO&NCIPI