In a vapour deposition method which can be used to deposit mixtures of materials in progressively varying amounts on a substrate (1) and which can be used for a variety of purposes, but is of especial value in combinatorial chemistry, the path of the vaporised material from the source (3) to the substrate (1) is partially interrupted by a mask (5), the positioning of the mask in a plane parallel to the plane defined by the substrate (1) being such that the material is deposited on the substrate (1) in a thickness which increases substantially continuously in a direction along the substrate (1).
申请公布号
WO2005035820(A1)
申请公布日期
2005.04.21
申请号
WO2004GB04255
申请日期
2004.10.08
申请人
UNIVERSITY OF SOUTHAMPTON;GUERIN, SAMUEL;HAYDEN, BRIAN, ELLIOTT