发明名称 STAGE DEVICE AND EXPOSURE DEVICE
摘要 <p>A stage device capable of controlling the temperature of an optical member without complicating the structure of a movable stage having the optical member. By using a Y-axis linear motor (76A, 78A, 76B, 78B), a reticle stage body (22) holding a reticle (R) is driven in the Y-direction on a reticle base (16). A measurement laser beam is radiated to a fixed mirror (MX) fixed on the reticle base (16) through an optical system (32) on an optical member support part (24B2) at the end of the reticle stage body (22) to measure the position of the reticle stage body (22) in the X-direction. To stabilize the temperature of the optical system (32), a rod member (27) is fixed to the bottom face of the optical member support part (24B2) through an air layer (35), and a temperature-controlled refrigerant is supplied into the rod member (27).</p>
申请公布号 WO2005036618(A1) 申请公布日期 2005.04.21
申请号 WO2004JP14280 申请日期 2004.09.29
申请人 NIKON CORPORATION;SHIBAZAKI, YUICHI 发明人 SHIBAZAKI, YUICHI
分类号 G01B11/00;G03F7/20;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G01B11/00
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