发明名称 SUBSTRATE-HOLDING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate-holding device which does not damage a substrate nor generate particles by noncontact correction of the deflection of the substrate. SOLUTION: The holding device includes holding members 3, 5 that hold a peripheral edge portion of the substrate 4, and an air discharge portion 8 which discharges air to a lower face of the substrate 4 and lifts a central portion of the substrate 4, at a lower side of the central portion of the substrate 4. The position of a vertical direction is arranged to be changed, by lifting up and down the air discharge portion 8. A sensor for detecting the deflection of the substrate 4 is provided, and the position of the vertical direction of the air discharge portion 8, and the pressure and the flow rate of the discharged air are adjusted according to a degree of the deflection. In addition, a sensor for detecting the inclination of the substrate holding device 1 is provided, and the position of the vertical direction of the air discharge portion 8, and the pressure and the flow rate of the discharged air are adjusted according to the degree of the inclination. The shape of the flow passage of the air discharge portion 8 is formed to have throttle effect. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005109404(A) 申请公布日期 2005.04.21
申请号 JP20030344402 申请日期 2003.10.02
申请人 YASKAWA ELECTRIC CORP 发明人 AKAE HIROMITSU;MOTOMURA YOICHI
分类号 H01L21/683;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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