| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-processing apparatus capable of enhancing the size uniformity of a pattern by preventing a processing liquid from stored nonuniformly on a processing face. SOLUTION: The substrate-processing apparatus is provided with a cup part 102, having a substrate support 104 for supporting a substrate 103 on its upper part and having a discharge port 105 at its bottom; motors 111, 112 for driving the cup part 102; and a nozzle 106 located below the substrate support 104. COPYRIGHT: (C)2005,JPO&NCIPI |
