发明名称 SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To enable manufacture of the quantum structure of an element for a quantum effect device by only the crystal growth technology, without application of special processings, especially to its quantum dots or quantum wires in a stage previous to crystal growth. SOLUTION: A single crystal of the same material as that of a compound semiconductor substrate 1 is grown on the substrate 1 as a buffer layer 2, and a growth layer 3 of a semiconductor material, having a lattice constant larger than that of the single crystal material of the buffer layer 2, is grown on the buffer 2. By utilizing a dislocation 4 generated at an interface between the buffer layer 2 and the growth layer 3, a quantum structure 6 is formed at a desired location, corresponding to the dislocation 4. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005109366(A) 申请公布日期 2005.04.21
申请号 JP20030343933 申请日期 2003.10.02
申请人 HITACHI CABLE LTD 发明人 KAWAGUCHI KAZUHISA;MEGURO TAKESHI
分类号 H01L29/06;H01L21/20;H01L21/205;H01S5/343;(IPC1-7):H01L29/06 主分类号 H01L29/06
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