| 摘要 |
PROBLEM TO BE SOLVED: To provide a vaporizer and a deposition system, in which the material gas supply state is stabilized by stabilizing atomization state of a liquid material in the vaporizer, and generation of particles can be suppressed. SOLUTION: The vaporizer comprises a means 211 for atomizing liquid material, a chamber having a plane for vaporizing atomized liquid material, and an opening for leading out material gas produced in the vaporization chamber, wherein the atomizing means is provided with a liquid material supply passage 211a and a passage 211d supplying gas for atomizing the liquid material supplied through the material supply passage, and the material ejection opening 211A of the material supply passage and the gas ejection opening 211D of the gas supply passage are arranged contiguous to each other. The vaporizer is further provided with a means 211z for mutually positioning the material ejection opening and the gas ejection opening. COPYRIGHT: (C)2005,JPO&NCIPI
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