| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum deposition system for plastic vessels having a high quality barrier property which can shorten the cycle time necessary for film deposition treatment, prevents the increase of size, complication and cost increase of the system in a vacuum deposition system using a plasma chemical vapor deposition (CVD) process for the plastic vessels. SOLUTION: The vacuum deposition system for cylindrical plastic vessels 1 is provided with a gaseous raw material supply tube 3 for supplying gaseous raw materials into a vacuum chamber 2 housing the plastic vessels 1 and deposits thin films by a plasma CVD process on the inside surfaces of the vessels 1 by supplying the gaseous raw materials into the vessels 1. The vacuum deposition system is further provided with: a deposition chamber 23 which maintains vacuum and performs deposition simultaneously to the plurality of vessels 1; and a plurality of exhaust chambers 24 which change the pressure from the atmospheric pressure to vacuum and from the vacuum to the atmospheric pressure. The entire part of the system rotates. COPYRIGHT: (C)2005,JPO&NCIPI
|
