Apparatus and method for supplying a source, and method of depositing an atomic layer using the same

摘要

Methods of supplying a source to a reactor include charging a gaseous source into a charging volume by selectively activating a source charger coupled between the charging volume and a source reservoir. The gaseous source is then supplied from the charging volume into a deposition process reactor by selectively activating a source supplier coupled between the charging volume and the reactor after the gaseous source in the charging volume attains a desired internal pressure. Apparatus for supplying a source and methods and apparatus for depositing an atomic layer are also provided.