PARTS FOR VACUUM APPARATUS, MANUFACTURING PROCESS THEREOF AND VACUUM APPARATUS COMPRISING IT

摘要

A component for a vacuum apparatus for use in a plasma processing apparatus or a film forming apparatus for a semiconductor or the like, in which a surface is covered with a ceramic and/or metallic thermal spray film and projection-shaped particles of a width of 10 - 300 mu m, a height of 4 - 600 mu m and an average height/width ratio of 0.4 or higher are present within a range of 20 - 20,000 particle/mm<2> on the surface of the thermal spray film. The thermal spray film has a porosity of 10 - 40 %, shows a high adhering property to a film-shaped substance, is free from a product contamination by particles generated by a peeling of the film-shaped substance and can be continuously used over a prolonged period,