发明名称 |
Positive photosensitive composition and method of forming resist pattern |
摘要 |
<p>A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-containing resin having a group that increases a solubility of the resin in an alkaline developer by the action of an acid.</p> |
申请公布号 |
EP1505439(A3) |
申请公布日期 |
2005.04.20 |
申请号 |
EP20040017305 |
申请日期 |
2004.07.22 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA, KUNIHIKO |
分类号 |
G03F7/004;G03F7/039;G03F7/20;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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