发明名称 Procédé de fabrication de diodes tunnel en arséniure de gallium
摘要 1,179,420. Tunnel diodes. N. PUYCHEVRIER, and M. MENORET. 3 Oct., 1967 [3 Oct., 1966], No. 44899/67. Heading H1K. A tunnel diode comprising a heavily-doped N-type GaAs plate I having fused thereto a Zncovered Cu wire 2 is manufactured by placing the Zn-covered wire 2 in contact with the doped GaAs plate and then applying a reverse-biasing voltage pulse between the plate 1 and wire 2 of such amplitude and duration that the pulse ceases when the current flowing reaches a predetermined value whereby the wire 2 is fused to the plate 1 and a P-type impurity in the form of zinc is diffused into the plate I to form a junction therein. The plate 1 containing 10<SP>19</SP> atoms. cm.<SP>-3</SP> of selenium is initially soldered by a Sn-Pb solder to copper wire 11 while galvanized copper wire 12 is soldered to the wire 12. Wires 11 and 12 are supported within a glass bead 10. After formation the tunnel diode is varnished and encased.
申请公布号 FR1501996(A) 申请公布日期 1967.11.18
申请号 FR19660078583 申请日期 1966.10.03
申请人 发明人 SERVIAT NICOLE;MENORET MAURICE
分类号 H01L21/00;H01L21/24;H01L29/00;H01L29/207;H01L29/88 主分类号 H01L21/00
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