| 摘要 |
The unit has two interference patterns, where each pattern is created through simultaneous exposure of a reference (14) and parallel partial wave front (15,16,17), which are generated by a monochromatic and coherent light source for hitting the unit at a different angles. The interference patterns intersect behind the unit in a center of a measuring field (18), if the partial fronts are virtually extended through the unit. The number of the partial wave fronts is used for exposure of the unit corresponding to a number of interference patterns. Independent claims are also included for the following: (a) a measuring arrangement for measuring a dimension and position of an object; (b) a method for measuring a dimension and position of an object; and (c) a device for measuring a dimension and position of an object. |
