发明名称 |
DEFECT INSPECTION METHODS THAT INCLUDE ACQUIRING AERIAL IMAGES OF A RETICLE FOR DIFFERENT LITHOGRAPHIC PROCESS VARIABLES |
摘要 |
Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images corresponding to at least two of the different values. A different method includes comparing at least one pair of the aerial images corresponding to at least two of the different values and determining an area on the reticle where a lithography process using the reticle is most susceptible to failure based on the results of the comparison. Another embodiment includes determining a presence of transient repeating defects on the reticle by subtracting non-transient defects from the aerial images and comparing at least one pair of the aerial images corresponding to at least two of the different values. |
申请公布号 |
EP1523696(A2) |
申请公布日期 |
2005.04.20 |
申请号 |
EP20030764592 |
申请日期 |
2003.07.15 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
PETERSON, INGRID, B.;VON DEN HOFF, MIKE;WILEY, JIM |
分类号 |
G03F;G03F1/00;G03F7/20;G06K9/00;H01L21/027 |
主分类号 |
G03F |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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